Stress Mitigation of X-ray Beamline Monochromators using a Topography Test Unit

Silicon and diamond monochromators (crystals), often used in the Advanced Photon Source X-ray beamlines, require a good quality surface finish and stress-free installation to ensure optimal performance. The device used to mount the crystal has been shown to be a major contributing source of stress. In this case, an adjustable mounting device is an effective method of reducing stresses and improve the rocking curve to levels much closer to ideal. Analysis by a topography test unit has been used to determine the distribution of stresses and to measure the rocking curve, as well as create CCD images of the crystal. This paper describes the process of measuring these stresses and manipulating the mounting device and crystal to create a substantially improved monochromator.